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Baoji Luox Quality Metals Co., Ltd.
Главная страница ПродукцияТитан брызгая цель

High-purity and high-density titanium sputtering target Titanium thin film material

High-purity and high-density titanium sputtering target Titanium thin film material

High-purity and high-density titanium sputtering target Titanium thin film material
High-purity and high-density titanium sputtering target Titanium thin film material High-purity and high-density titanium sputtering target Titanium thin film material

Большие изображения :  High-purity and high-density titanium sputtering target Titanium thin film material

Подробная информация о продукте:
Место происхождения: Китай
Фирменное наименование: N/M
Сертификация: ISO9001:2015 certification
Номер модели: CDX-TB-2021004
Документ: Брошюра продукта PDF
Оплата и доставка Условия:
Количество мин заказа: 5 kg
Цена: обсуждаемый
Упаковывая детали: случай переклейки
Время доставки: 5-35 рабочих дней
Поставка способности: 50000KG/month
Подробное описание продукта
ключевые слова: Титан брызгая цель имя: Плита цели титана
Применение: Индустрия, химикат, воздушно-космическое пространство, навигация, покрытие вакуума Метод: Выкованного, CNC выкованный подвергать механической обработке, горячекатаный, и CNC подвергли механи
Оценка: Gr1 Плотность: 4.51g/cm3

Titanium target

High-purity and high-density sputtering targets include:
Sputtering target (purity: 99.9%-99.999%)

Titanium target plate

High-purity and high-density titanium sputtering target
Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller, sputtering thin film material, semiconductor integrated circuit, solar photovoltaic, recording medium, flat display and surface coating of workpiece
Titanium target Titanium sputtering target material Used for liquid crystal display, laser memory, electronic controller,

sputtering thin film material
Titanium target Titanium sputtering target is used for semiconductor integrated circuit,

solar photovoltaic, recording medium, flat display and workpiece surface coating

Titanium target plate
Titanium sputtering target
Titanium target tube

Material:  Pure titanium Gr. 1
Application:

Titanium target Titanium sputtering target material Used for liquid crystal display, electronic controller, sputtering thin film material,

semiconductor integrated circuit,

solar photovoltaic,

recording medium,

flat display and surface coating of workpiece

Purity:  99.96% - 99.99%
Custom made:  support

Tolerance:

 

 +/-0.05mm

 

Shape:  round target, rectangular target

 

Usually we will provide a quality inspection report like this with the goods,

which shows the chemical composition and physical properties

 

Terms of trade EXW FOB CIF
Payment terms T/T , L/C
packing Plastic paper inside , plywood case outside
Delivery time In general,the delivery time is 5 days to 35 days. Please confirm the exact delivery time with us as different products and different quantity need different delivery time.
MOQ Small order quantity is acceptable

 

High-purity and high-density titanium sputtering target Titanium thin film material 0

High-purity and high-density titanium sputtering target Titanium thin film material 1

Q: Why choose us?

A1: We have 14 years experience for titanium products making.

A2: sample order is acceptable.

A3: lower price, good quality and short delivery time.

A4:The quotation can be make within 24 hours.

A5: ISO9001:2015 certification

A6: Give us drawing, make your drawings and ideas become a reality!

A7: Provide third-party quality inspection reports.

 

 

 

Контактная информация
Baoji Luox Quality Metals Co., Ltd.

Контактное лицо: Ms. Grace

Телефон: +8613911115555

Факс: 86-0755-11111111

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